Chemical and physical processes occurring at gas-liquid-plasma-solid interfaces are crucial for many applications, and yet their analysis often represents grand scientific and engineering challenges. The Chemical Analysis and Imaging at Interfaces Focus Topic symposium is designed as a cross-disciplinary “melting pot” and aims to disseminate the latest and emerging developments and trends in experimental methods and understanding of the interfacial physical and chemical processes relevant (but not limited) to device microfabrication, materials synthesis, energy/catalysis research, biomedical applications, environmental sciences, and surface modifications, to name a few. In particular, in (ex-) situ/in vivo/operando chemical imaging, microscopy, and spectroscopy studies using electron, X-ray, ion, and neutron beams, as well as optical methods and synchrotron radiation/ FEL facilities, are strongly encouraged. Attention will also be paid to correlative spectroscopy and microscopy methods, modern image/spectra processing, and AI-enabling data acquisition and analytics techniques. Contributions are invited, including but not limited to experimental, fundamental research, industrial R&D, novel analytical techniques/approaches, and metrology of realistic surfaces and interfaces.
Areas of Interest:
- In situ and operando characterization of interfaces related to semiconductor fabrication, including plasma environments and fast-changing processes
- AI-assisted modeling and learning applied to interfacial processes characterization and analysis
- Advances in multimodal measurement capabilities in the industry
- Materials and interfaces for next-generation electronics and technologies
CA1: Chemical Analysis and Imaging at Interfaces Oral Session
Invited Speakers:
- Matthew Cherukara, Argonne National Laboratory
- Vincent Donnelly, University of Houston
- Alex Liddle, Canon Nanotechnologies
- Andrew Yost, Scienta-Omicron, Sweden
CA2: Characterization and Modeling of Battery Interfaces Oral Session
Invited Speakers:
- David L. Jacobson, NIST
- Sen Zhang, University of Virginia
CA3: Chemical Analysis and Imaging at Interfaces Poster Session