Group: Spectroscopic Ellipsometry (EL)

The Spectroscopic Ellipsometry Topic positions spectroscopic ellipsometry as a core, polarization-resolved optical metrology for understanding materials, interfaces, and thin film systems across fabrication, characterization, and application-driven research. The session emphasizes how ellipsometry provides quantitative access to optical, electronic, and structural properties, enabling direct connections between material growth, physical response, and functional performance.

The topic highlights advances in ellipsometric analysis and instrumentation that extend sensitivity from atomic-scale film evolution to complex anisotropic and nanostructured systems, while supporting insight into optical transitions, interfacial processes, and spatially heterogeneous responses. By bridging real-time growth monitoring, detailed optical modeling, and emerging application spaces, the EL Topic reflects the evolving role of spectroscopic ellipsometry as an enabling platform for modern materials science and engineering.

We will also focus on workforce development for future spectroscopic ellipsometry, with student talks and awards for best oral presentation and best poster in the EL session.

EL-ThA: Spectroscopic Ellipsometry Oral Session

• Matthew Hilfiker, Onto Innovation, “Spectroscopic Ellipsometry for Advanced Semiconductor Metrology Applications”

EL-ThP: Spectroscopic Ellipsometry Poster Session