The Atomic Scale Processing Mini-Symposium is aimed to provide a unique forum to expand the scope of atomic layer deposition (ALD) and atomic layer etching (ALE) processes towards understanding the fundamentals needed to achieve true atomic scale precision and the application of such processing on various areas of interest to the broader AVS community. The emphasis will be on synergistic efforts across multiple AVS divisions and groups to generate area-selective processes as well as novel characterization methods to advance the field of processing at the atomic scale. We are excited to offer several sessions in collaboration with the Plasma Science & Technology Division, the Thin Film Division, the Spectroscopic Ellipsometry Technical Group, as well as the Electronic Materials and Photonics Division, focusing on area selective deposition, atomic layer process chemistry & surface characterization, and finally both thermal and plasma-based atomic layer etching and atomic layer deposition.
Areas of Interest: AP is seeking abstracts in the following themes:
- Area Selective Processing and Patterning
- Advancing Metrology and Characterization to enable Atomic Scale Processing
- Atomic Layer Processing: Integration of Deposition and Etching for Advanced Material Processing
- Thermal and Plasma-Enhanced Atomic Layer Etching
- Thermal and Plasma-Enhanced ALD
- Emerging Applications for ALD, including Precursors and Surface Reactions
AP1+EL+PS+TF: Atomic Scale Processing Mini-Symposium Oral Session
AP2+EL+PS+TF: Atomic Scale Processing Mini-Symposium Poster Session