New for AVS72, the Advanced Microelectronic Materials and Devices Mini Symposium will provide engaging sessions on the processing, characterization, and application of thin-film materials for microelectronics and devices. With invited presentations from leading microelectronics companies and focused sessions on ferroelectric thin films and emerging devices, the AM mini symposium brings together researchers focused on materials, processing, and devices for next-generation microelectronics.
AM1+EM+TF-WeA: Industry Perspective
- Biswajeet Guha, Intel Corporation, “Angstrom-Era Logic: From Nanosheets to Hybrid Bonding”
- Shivani Srivastava, Micron Technology, “Memory-Centric AI and the Role of Advanced Materials in Future Semiconductor Technologies”
AM2+EM+TF-WeA: Devices I
AM+EM+TF-ThM: Ferroelectric Thin Films
- Jon-Paul Maria, Penn State University, “Processing and Properties of Ferroelectric Wurtzite Thin Films”
- Andrew Meng, University of Missouri-Columbia, “Ferroelectricity in Atomic Layer Annealed Nitride-Based Thin Films”
AM+EM+TF-ThA: ALD Fundamentals to Devices & Flash Session
- Zsófia Baji, Centre for Energy Research, Hungary, “When Growth Has Not Yet Begun: Nucleation and Interface Control in Atomic Layer Deposition”
AM+EM+TF-ThP: Advanced Microelectronic Materials and Devices Mini-Symposium Poster Session
AM1+EM+TF-FrM: Materials Discovery and Synthesis
- Christopher Hinkle, University of Notre Dame, “Machine Learning for Electronic Materials Discovery and Synthesis”
AM2+EM+TF-FrM: Devices II